Solid Oxide Fuel Cell Electrolyte Membrane Fabrication

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Literature Review 18 ________________________________________________________________________ 300 V were dense. As the substrate bias was increased, the deposited film became thinner, suggesting that a more intense ion bombardment was leading to resputtering of the film during the deposition process [49]. In a follow-on study to the work of Tsai and Barnett, Yashar et al. [50] deposited YSZ via a reactive magnetron sputtering process, achieving a deposition rate of 12-13 µm/hr onto steel, stainless steel, and glass substrates.

These two screws were used to introduce large AC currents into the filament (20-40 A). To make certain that the screw electrodes did not melt under such high current, screws of at least 3 mm diameter were used. The filament and electrode screws were consumable and had to be replaced occasionally. To heat the substrate evenly and prevent sticking problems caused by hot contact points, a piece of boron nitride (thickness 2 mm) was always mounted between the filament and the substrate. Additionally, a boron nitride spray was applied to the backside of the substrate to further reduce the chance of sticking.

2: Setpoints for electrolyte membrane layer experiments Experiment Experimental setpoints 1 a) As-received substrate 2 a) As-received substrate b) 60 A plasma current 3 a) As-received substrate b) 60 A plasma current c) 50 V, DC- substrate bias 4 a) As-received substrate b) 120 A plasma current c) 50 V, DC- substrate bias 5 a) As-received substrate b) 120 A plasma current c) 200 V, DC- substrate bias 6 a) As-received substrate b) 120 A plasma current c) 200 V, AC substrate bias (24 µsec+/24 µsec-) 7 a) Polished substrate b) 120 A plasma current c) 200 V, AC substrate bias (24 µsec+/24 µsec-) 8 a) Polished substrate b) 180 A plasma current c) 200 V, AC substrate bias (24 µsec+/24 µsec-) Chapter 3.

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